ion-solid-interactions

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Ion Solid Interactions

Author : Michael Nastasi
ISBN : 052137376X
Genre : Science
File Size : 88. 17 MB
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Comprehensive guide to an important materials science technique for students and researchers.

Computer Simulation Of Ion Solid Interactions

Author : Wolfgang Eckstein
ISBN : 9783642735134
Genre : Science
File Size : 48. 91 MB
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In this book the author discusses the investigation of ion bombardment of solids by computer simulation, with the aim of demonstrating the usefulness of this approach to the problem of interactions of ions with solids. The various chapters present the basic physics behind the simulation programs, their structure and many applications to different topics. The two main streams, the binary collision model and the classical dynamics model, are discussed, as are interaction potentials and electronic energy losses. The main topics investigated are backscattering, sputtering and implantation for incident atomic particles with energies from the eV to the MeV range. An extensive overview of the literature is given, making this book of interest to the active reseacher as well to students entering the field.

Ion Solid Interactions For Materials Modification And Processing Volume 396

Author : David B. Poker
ISBN : UOM:39015037435461
Genre : Technology & Engineering
File Size : 35. 87 MB
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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Ion Solid Interactions Permuted Title Index

Author : Walter Maxwell Gibson
ISBN : CORNELL:31924004839332
Genre : Ion bombardment
File Size : 65. 5 MB
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Ion Solid Interactions

Author : Walter M. Gibson
ISBN : CORNELL:31924004839324
Genre : Ion bombardment
File Size : 39. 23 MB
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Cluster Ion Solid Interactions

Author : Zinetula Insepov
ISBN : 9781439875438
Genre : Science
File Size : 75. 50 MB
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Cluster Ion-Solid Interactions: Theory, Simulation, and Experiment provides an overview of various concepts in cluster physics and related topics in physics, including the fundamentals and tools underlying novel cluster ion beam technology. The material is based on the author’s highly regarded courses at Kyoto University, Purdue University, the Moscow Institute of Physics and Technology, and the Moscow Engineering Physics Institute as well as his research results on cluster ion beam applications at Kyoto University. The author introduces the basic principles of statistical physics and thermodynamics before covering applications, experimental justifications, and practical implementations. He describes classical nucleation theory and explains the drawbacks of this theory, showing how accurate modeling and simulations are necessary to justify theoretical approaches and simplifications.

Interaction Of Ions With Condensed Matter

Author : Arvaidas Galdikas
ISBN : 1560726660
Genre : Science
File Size : 58. 58 MB
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Interactions of Ions with Condensed Matter, Volume 229

Introduction To Focused Ion Beams

Author : Lucille A. Giannuzzi
ISBN : 038723313X
Genre : Science
File Size : 47. 31 MB
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Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.

Ion Beams In Materials Processing And Analysis

Author : Bernd Schmidt
ISBN : 9783211993569
Genre : Technology & Engineering
File Size : 20. 93 MB
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A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Beam Solid Interactions Volume 157

Author : James A. Knapp
ISBN : UOM:39015018476526
Genre : Science
File Size : 39. 62 MB
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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Beam Solid Interactions For Materials Synthesis And Characterization Volume 354

Author : Dale C. Jacobson
ISBN : UOM:39015034507874
Genre : Technology & Engineering
File Size : 78. 92 MB
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Proceedings of the title symposium, held at the 1994 MRS Fall Meeting in Boston, 28 November-2 December 1994. Selected papers that were presented in both oral and poster sessions are divided into six topical groups: ion beam processing; defects and diffusion; ion-beam modification of polymers; analysis and characterization; sputtering; and laser-assisted and induced processes. Annotation copyright by Book News, Inc., Portland, OR

Beam Solid Interactions Volume 279

Author : Michael Nastasi
ISBN : UOM:39015028927583
Genre : Science
File Size : 27. 58 MB
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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Ion Implantation And Synthesis Of Materials

Author : Michael Nastasi
ISBN : 9783540452980
Genre : Science
File Size : 90. 24 MB
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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Ion Beam Synthesis And Processing Of Advanced Materials Volume 647

Author : Steven C. Moss
ISBN : UOM:39015053387455
Genre : Technology & Engineering
File Size : 63. 27 MB
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The presentations during this November 2000 symposium emphasize the broad scientific and technological interest in ion-beam applications to synthesis and processing of advanced materials. A significant portion of the symposium addressed ion-beam processing and synthesis at the nano-scale, including work on nanocrystals, quantum dots, quantum wells, nanotubes, and self-organized structures, as well as heterostructures and other thin films. c. Book News Inc.

Direct Write Technologies For Rapid Prototyping Applications

Author : Alberto Pique
ISBN : 0121742318
Genre : Technology & Engineering
File Size : 87. 84 MB
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Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. An overview of the different direct write techniques currently available A comparison between the strengths and special attributes for each of the techniques An overview of the state-of-the-art technology involved in this field

Introduction To Focused Ion Beam Nanometrology

Author : David C. Cox
ISBN : 9781681741482
Genre : Science
File Size : 60. 68 MB
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This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

Ion Beam Analysis

Author : Michael Nastasi
ISBN : 9781439846384
Genre : Science
File Size : 42. 57 MB
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Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. Examines classical collision theory Details the fundamentals of five specific ion beam analysis techniques Illustrates specific applications, including biomedicine and thin film analysis Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.

Materials Processing By Cluster Ion Beams

Author : Isao Yamada
ISBN : 9781498711760
Genre : Science
File Size : 83. 8 MB
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Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f

Materials Analysis By Ion Channeling

Author : Leonard C. Feldman
ISBN : 9780323139816
Genre : Technology & Engineering
File Size : 50. 16 MB
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Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.

Fundamentals Of Radiation Materials Science

Author : Gary S. Was
ISBN : 9783540494713
Genre : Technology & Engineering
File Size : 33. 98 MB
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This book is an eye-opening treatise on the fundamentals of the effects of radiation on metals and alloys. When energetic particles strike a solid, numerous processes occur that can change the physical and mechanical properties of the material. Metals and alloys represent an important class of materials that are subject to intense radiation fields. Radiation causes metals and alloys to swell, distort, blister, harden, soften and deform. This textbook and reference covers the basics of particle-atom interaction for a range of particle types, the amount and spatial extent of the resulting radiation damage, the physical effects of irradiation and the changes in mechanical behavior of irradiated metals and alloys.

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