dry-etching-technology-for-semiconductors

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Dry Etching Technology For Semiconductors

Author : Kazuo Nojiri
ISBN : 9783319102955
Genre : Technology & Engineering
File Size : 54. 83 MB
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This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

Dry Etching For Microelectronics

Author : R.A. Powell
ISBN : 9780080983585
Genre : Technology & Engineering
File Size : 32. 39 MB
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This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.

Semiconductor Ic Plasma Dry Etching Process

Author : Kung Linliu
ISBN : 9798612696827
Genre :
File Size : 41. 34 MB
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Semiconductor market value of 2018 was around 468.8 billion US dollars. It is increased for about 13.7% than year 2017. For 2019, it is estimated decrease about 10% to 13% which is 422 to 408 billion US dollars.This market is in a way winner takes all, for example, TSMC (Taiwan Semiconductor Manufacturing Company) which is the world leading semiconductor foundry company has more than 50% market share. Intel has more than 90% market share of personal computer CPU (Central Process Unit) for many years. However, the semiconductor IC process technology sometimes might change the rule of market. Just recently, AMD (Advanced Micro Devices, Inc.) has more than 17% market share of personal computer CPU because they use foundry of TSMC with 7nm EUV technology node (Extreme Ultraviolet, its wavelength is 13.5 nm, shorter wavelength has better critical dimension (CD) resolution for IC process).For the present time, there are four leading semiconductor companies in the world with EUV technology process node which are as follows: (1)Samsung: the world leading semiconductor IC process company for commodity IC such as DRAM、Flash memory and IC for cell phone. The world leading company in cell phone market share, Samsung has highest volume unit of mobile phone which is 75.1 million unit representing 23% of world market share. Samsung also is the leading company in OLED (organic light emitting diode) process technology and display panel which is more than 90% of world market share.(2)Intel: is the world leading company in personal computer CPU which has more than 90% market share of personal computer CPU (Central Process Unit) for many years. Intel is actually a world leading semiconductor IC technology in DRAM (many years ago) and Flash (at the present time) memory.(3)TSMC: TSMC is brief of Taiwan Semiconductor Manufacturing Company which is the world leading semiconductor foundry company has more than 50% market share. The author worked there for a few years as an R & D manager many years ago.(4)Micron: a world leading in DRAM and Flash memory IC.

Fundamentals Of Semiconductor Processing Technology

Author : Badih El-Kareh
ISBN : 9781461522096
Genre : Technology & Engineering
File Size : 35. 75 MB
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The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

Semiconductor Fabrication

Author : Dinesh C. Gupta
ISBN : 0803112734
Genre : Technology & Engineering
File Size : 41. 56 MB
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Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 11

Author : T. Hattori
ISBN : 9781566777421
Genre : Semiconductor wafers
File Size : 57. 57 MB
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This issue of ECS Transactions includes papers presented during the 11th International Symposium on Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing held during the ECS Fall Meeting in Vienna, Austria, October 4-9, 2009.

Handbook Of Semiconductor Manufacturing Technology Second Edition

Author : Yoshio Nishi
ISBN : 1420017667
Genre : Technology & Engineering
File Size : 51. 99 MB
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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Dry Etching For Vlsi

Author : A.J. van Roosmalen
ISBN : 9781489925664
Genre : Science
File Size : 53. 48 MB
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This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

Plasma Etching In Semiconductor Fabrication

Author : Russ A. Morgan
ISBN : 0444424199
Genre : Science
File Size : 51. 43 MB
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Hardbound. This book is based on a post-graduate study carried out by the author on plasma etching mechanisms of semiconductor materials such as silicon, silicon dioxide, photoresist and aluminium films used in integrated circuit fabrication. In this book he gives an extensive review of the chemistry of dry etching, sustaining mechanisms and reactor architecture. He also describes a study made on the measurement of the electrical characteristics and ionization conditions existing in a planar reactor. In addition, practical problems such as photoresist mask erosion have been investigated and the reader will find the photoresist chemistry very useful. The book contains a great deal of practical information on plasma etching processes. The electronics industry is continually seeking ways to improve the miniaturization of devices, and this account of the author's findings should be a useful contribution to the work of miniaturization.

Proceedings Of The Fifth International Symposium On Cleaning Technology In Semiconductor Device Manufacturing

Author : Jerzy Rużyłło
ISBN : 1566771889
Genre : Technology & Engineering
File Size : 67. 74 MB
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Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 10

Author : Takeshi Hattori
ISBN : 9781566775687
Genre : Semiconductor device
File Size : 35. 33 MB
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This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.

State Of The Art Program On Compound Semiconductors 46 Sotapocs 46 And Processes At The Semiconductor Solution Interface 2

Author : C. O'Dwyer
ISBN : 9781566775519
Genre : Compound semiconductors
File Size : 65. 33 MB
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Section 1 addresses the most recent developments in processes at the semiconductor-solution interface include etching, oxidation, passivation, film growth, porous semiconductor formation, electrochemical, photoelectrochemical, electroluminescence and photoluminescence processes, electroanalytical measurements and related topics on both elemental and compound semiconductors. Section 2 addresses the most recent developments in compound semiconductors encompassing advanced devices, materials growth, characterization, processing, device fabrication, reliability, and related topics.

Emerging Semiconductor Technology

Author : Dinesh C. Gupta
ISBN : 0803104596
Genre : Technology & Engineering
File Size : 81. 93 MB
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Proceedings Of The Tutorial Symposium On Semiconductor Technology

Author : Electrochemical Society. Dielectrics and Insulation Division
ISBN : STANFORD:36105030367010
Genre : Circuits intégrés - Congrès
File Size : 20. 62 MB
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Plasma Etching Processes For Sub Quarter Micron Devices

Author : G. S. Mathad
ISBN : 1566772532
Genre : Integrated circuits
File Size : 44. 11 MB
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Technology Of Si Ge And Sic Technologie Von Si Ge Und Sic

Author : W. Dietze
ISBN : 3540114742
Genre : Science
File Size : 73. 42 MB
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Semiconductor Technologies 1984

Author : Jun-ichi Nishizawa
ISBN : 4274030369
Genre : Semiconductors
File Size : 27. 96 MB
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Semiconductor Technology Istc 2001

Author : Ming Yang
ISBN : UCAL:C3785030
Genre : Semiconductors
File Size : 60. 12 MB
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Technology Of Integrated Circuits

Author : D. Widmann
ISBN : 9783662041604
Genre : Technology & Engineering
File Size : 76. 91 MB
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This is the first book to comprehensively record the authors’ authoritative knowledge and practical experience of IC manufacturing, including the tremendous developments of recent years. With its strong application orientation, this is a must-have book for professionals in semiconductor industries.

Cleaning Technology In Semiconductor Device Manufacturing Viii

Author : Jerzy Rużyłło
ISBN : 156677411X
Genre : Technology & Engineering
File Size : 64. 52 MB
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